Pi111 PLUS G3
The Pi111 PLUS G3 is the third generation of PLATIT’s small PVD coating unit. It offers short cycle times, simple operation and high user-friendliness at an attractive price – without compromising on coating performance. Thanks to two rotating cathodes with arc technology, the unit enables to deposit selected PLATIT Signature Coatings in reproducible high-quality.
The Pi111 PLUS G3 is the best choice for customers looking for a high-quality entry into the coating world or those who want to add a fast, low-volume PVD unit to their machinery.
Pi111 TRM
The Pi111 TRM is a state-of-the-art PVD coating unit featuring PLATIT’s Twin Rotary Magnetron technology. Its two rotating sputter cathodes with advanced magnetron technology deliver dense, droplet-free coatings essential e.g., for micro tools and challenging applications such as reamers or taps. The Pi111 TRM ensures superior coating performance and flexibility. Ideal for manufacturers seeking a fast, efficient sputtering machine with the latest technology at a reasonable cost, the Pi111 TRM is the perfect addition to any advanced coating operation.
Technology
Pi111 PLUS G3
- 2 x LARC® PLUS cathode (LAteral Rotating Cathode) for arc coating
Compare the advantages of LARC® PLUS cathodes versus LARC® cathodes:
- Up to 30% improved target utilization
- Increased deposition rate thanks to optimized magnetic field system
- Quick cathode exchange
Pi111 TRM
- 2 x bipulse HiPIMS rotary magnetrons
